Without any assumptions regarding
residual impurity species in an undoped semiconductor, it is experimentally
demonstrated that the densities and energy levels of impurities can be
precisely determined by the graphical peak analysis method based on Hall-effect
measurements, referred to as free carrier concentration spectroscopy (FCCS).
Using p-type undoped GaSb epilayers grown by molecular beam epitaxy (MBE), the
densities and energy levels of several acceptor species are accurately
determined. Five acceptor species are detected in the undoped GaSb epilayers
grown by MBE, while two are also found in p-type undoped GaSb wafers. A 21–41
meV acceptor and a 75–99 meV acceptor exist both in the epilayers and in the
wafer. On the other hand, a 164–181 meV acceptor is detected in epilayers grown
at an Sb4/Ga flux beam equivalent pressure ratio of 8 or 10, while a 259 meV
acceptor is found in the epilayer grown at Sb4/Ga = 6. In addition, a very
shallow acceptor, which is completely ionized at 80 K, is found in the
epilayers. The densities of the very shallow acceptor and the 21–41 meV
acceptor are minimum at Sb4/Ga = 8, which makes the hole concentration lowest
in the temperature range of the measurement.
Source:IOPscience
For more information, please visit our website: www.semiconductorwafers.net,
send us email at sales@powerwaywafer.com and powerwaymaterial@gmail.com
没有评论:
发表评论