Spatial compositional analysis has been carried out on single and polycrystal wafers of GaSb grown from stoichiometric and non-stoichiometric melts. In crystals grown from stoichiometric melt, the ratio of Ga to Sb is slightly more and remains uniform throughout. At the grain boundaries in polycrystals, the Sb content is more than in the other regions of the crystal. Crystals grown from either Ga- or Sb-rich melts exhibit inclusions of the excess component. Post-growth annealing treatments in vacuum and Ga-rich atmospheres have been performed. Heat treatments in vacuum atmosphere produce very little effect on the local composition of the crystal. On the other hand, localized crystallization at grain boundaries and inclusions takes place in the presence of excess gallium. It has been shown that annealing treatments in Ga ambient can produce defect-free wafers with extremely homogeneous composition. It is concluded that the excess Sb which is liberated from the crystal during growth resides at the grain boundaries and other extended defect centers. The vacant Sb sites are then responsible for the formation of the native acceptor centers like VGa and GaSb.
The growth of Sb nanowires on GaSb(111)A substrates is studied by in situ azimuthal scan reflection high-energy electron diffraction (ARHEED). Bulk and layer contributions can be distinguished in the ARHEED transmission pattern through the Sb nanowires. The three-dimensional structure of the growing Sb nanowires is identified by post-growth atomic force microscopy (AFM) and x-ray diffraction (XRD). The lattice match of the Sb crystal along the and the GaSb crystal along directions lead to a preferential orientation of the Sb nanowires. The Sb adsorption and desorption kinetics is studied by thermal desorption spectroscopy.